The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
Grant agreement ID: 101057029
Starting date of the project: 01/10/2022
Duration: 48 months
Project Coordinator: JOANNEUM RESEARCH Forschungsgesellschaft mbH
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