The OPTIMAL project aims to revolutionize the manufacturing of structures, known as masters, which are crucial for replication techniques in various fields such as optics, industry, and medical device fabrication. For the first time, it will integrate different laser lithography technologies, quality monitoring systems, and processes into a single platform. This integration will enable the development of structures with high depth, dimensions ranging from 100 nm to sub-mm, and 2D & 3D shapes on flat surfaces. The project combines parallel and serial patterning, eliminates the need for external treatments on samples, and increases speed and coverage area. Furthermore, the OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.


Grant agreement ID: 101057029 

Starting date of the project: 01/10/2022   

Duration: 48 months 

Project Coordinator:  JOANNEUM RESEARCH Forschungsgesellschaft mbH 

For additional information please contact  







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