OPTIMAL to Participate in NILindustrialday 2026 in Berlin

OPTIMAL will participate in NILindustrialday 2026, taking place on 1–2 June 2026 in Berlin, Germany.

NILindustrialday is an annual international conference dedicated to the industrial applications of Nanoimprint Lithography (NIL), bringing together researchers, technology developers, and industry representatives from across the field. The 2026 edition also marks the event’s 15th anniversary.

The conference will provide an opportunity to discuss the latest advances in NIL materials, processes, and manufacturing technologies, while fostering collaboration between academia and industry. OPTIMAL is pleased to join the event and contribute to the exchange of knowledge and innovation within the NIL community.

Event details

Event: NILindustrialday 2026
Date: 1–2 June 2026
Location: Seminaris CampusHotel Berlin, Germany
Further information and registration are available at:
https://microresist.de/en/nil2026/

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Horizon project - OPTIMAL

Last update 18/05/2026

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Funded by the European Union

The OPTIMAL project receives funding from the European Union’s Horizon Europe research and innovation programme under Grant Agreement No. 101057029.

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