OPTIMAL Project Showcased at SPIE Photonics Europe 2026

Strasbourg, France – The OPTIMAL project recently marked a significant presence at the SPIE Photonics Europe conference. Representing the consortium, team members David and [Your Name] presented the project’s latest advancements in automated maskless laser lithography to an international audience of photonics experts.
Multi-Format Dissemination
The project’s participation was highlighted by two primary engagement activities:
• Marketplace Presentation: A dedicated talk focused on the OPTIMAL "First Time Right" methodology. The session detailed how the integration of self-learning algorithms and inline control processes is being used to optimize mixed-scale patterning.
• Exhibition & Poster Session: At the project’s mini-booth, researchers displayed a comprehensive roll-up banner and technical posters. This provided a platform for one-on-one technical discussions regarding the project’s "all-in-one" platform capabilities, including its $2000 \text{ cm}^2$ area coverage and sub-150 nm critical dimensions.
Driving Industry Applications
During the event, the team engaged with industry stakeholders to discuss the real-world applications of the OPTIMAL technology, specifically in the fields of:
1. Industrial Optics: Full-polymer microlenses.
2. Aviation: Hierarchical multifunctional drag-reduction structures.
3. Medical Devices: Microfluidic hierarchical structures for lab-on-chip applications.
The feedback received during the Strasbourg conference underscores the growing demand for sustainable, high-speed, and maskless lithography solutions within the European manufacturing ecosystem.

OPTIMAL Project Showcased at SPIE Photonics Europe 2026

Archives