OPTIMAL project presented at the NMLS Symposium 2025!

The OPTIMAL project was showcased at the Nano-Micro-Lithography Symposium 2025, held in Eindhoven, Netherlands, on March 13, 2025. In this regularly occurring symposium, the latest technologies and products for nano and microlithography are presented. Customers and representatives of the hosting companies (Nanoscribe, HIMT, micro resist technology GmbH, GeniSys) provide detailed insights into their microfabrication projects and describe experiences with various products and technologies. Within the additional “Process workshop” participants have the unique opportunity to talk to and to discuss with experts of the hosting companies, ask questions, solve problems and gain new insights. An overview of the OPTIMAL project including some outcome results were presented.

 

Presented by: Dr. Anja Voigt

Website: https://www.genisys-gmbh.com/events-detail/nano-micro-lithography-symposium-2025.html

 

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Horizon project - OPTIMAL

Last update 09/04/2025


Funded by the European Union

The OPTIMAL project receives funding from the European Union’s Horizon Europe research and innovation programme under Grant Agreement No. 101057029.

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