New OPTIMAL Project Paper Accepted for Publication in Optics and Laser Technology

We are pleased to announce that a new scientific publication resulting from the OPTIMAL project has been accepted for publication in Optics and Laser Technology (Elsevier).

The accepted paper, entitled "Multiscale hierarchical microstructures fabricated by combining direct laser writing and laser interference lithography for direction-dependent patterning", presents an advanced microfabrication strategy that combines Direct Laser Writing (DLW) and Laser Interference Lithography (LIL) to produce multiscale hierarchical surface microstructures with direction-dependent patterns.

This research contributes to the development of innovative laser-based manufacturing techniques for engineering functional surfaces with tailored properties, supporting the OPTIMAL project's objectives of advancing next-generation photonic manufacturing technologies.

The article is currently in production and will soon be available online.

We warmly congratulate all the authors and project partners involved in this achievement and look forward to sharing the published article as soon as it becomes available.

New OPTIMAL Project Paper Accepted for Publication in Optics and Laser Technology

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