AI and Lithography: Project Presented at the ICOP 2026 International Conference in L'Aquila

We are proud to announce that our team has successfully participated in the prestigious ICOP 2026 (International Conference on Optics and Photonics), held this year in the historic city of L'Aquila, Italy.

During the event, we presented our latest research breakthrough titled:

👉 "Artificial Intelligence for topography optimization in grayscale laser lithography"

The Core of the Research: Optimization and AI
Grayscale laser lithography is a cornerstone technology for fabricating complex 3D microstructures, which are essential for advanced micro-optics and semiconductor devices. However, the process is historically hindered by strong non-linearities, requiring lengthy and costly trial-and-error cycles to achieve the target topography.

Our study introduces a radically innovative approach: integrating Artificial Intelligence algorithms engineered to accurately predict material behavior and optimize the topographic profile in real time. Our latest results demonstrate a drastic reduction in development cycles and unprecedented fidelity in 3D surface reproduction.

AI and Lithography: Project Presented at the ICOP 2026 International Conference in L'Aquila

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